Loading...
The New Industrial General Permit, Effective July 1, 2015 2017-02-19T19:13:24+00:00

The New Industrial General Permit

A quick guide to the New Industrial General permit and the changes from the 1997 General Permit.

If your business has an industrial SIC code, most likely you have been permitted by California’s State Water Resources Control Board (SWRCB) and are subject to the Industrial General Permit (IGP) for Stormwater Discharge. However, with the adoption of the New IGP, there are significant changes that vastly increase the burden of compliance for industrial businesses.

Significant Changes

Some of the significant changes to the new Industrial General Permit (IGP) for Storm Water include:

  • Additional Stormwater Monitoring Requirements: Industrial Permit holders are now required to complete Monthly Visual Observations during dry weather. Observations should address potential pollutant sources, drainage locations and the best management practices (BMPs) in place.
  • Increased Number of Sample Events per Year: Industrial Permit holders are now required to collect four (4) stormwater samples during each stormwater year. Two (2) samples will be collected during the first half of the year, July 1 through December 31, and two will be collected during the second half of the year, January 1 through June 30.
  • Numeric Action Level (NAL) Effluent Standards for Stormwater Discharges: The new IGP has two different types of NAL exceedances, the annual NAL and the instantaneous maximum NAL. An annual NAL occurs when the average of all the sample results from a reporting year exceeds the annual NAL for a single parameter. An instantaneous maximum NAL occurs when two or more sample results for a single parameter exceed the instantaneous NAL for that parameter.
  • Mandatory Best Management Practices (BMPs): Basic Best Management Practices (BMPs) are the scheduling of activities, prohibitions of practices, maintenance procedures, and other management practices to prevent or reduce the discharge of pollutants. Industrial Permit holders are required to implement a set of minimum BMPs, and if necessary advanced BMPs to reduce or prevent pollutants in industrial stormwater discharges.
  • More Stringent Storm Water Pollution Prevention Plan (SWPPP): SWPPPs are required to include a site map, industrial materials list, description and assessment of potential pollutant sources, description of minimum and advanced BMPs and a Monitoring Implementation Plan (MIP). A designated SWPPP team is also required to be identified in the plan.
  • Electronic Reporting Requirements via the Stormwater Multiple Application and Report Tracking System, (SMARTS) Database: Industrial Permit holders are required to certify all reports electronically via the SMARTS database including; Notice-of Intent (NOI) Application and Recertification, SWPPP, facility site map, all analytical results from stormwater samples, and Annual Reports.
  • Baseline, Level 1 and Level 2 Status: Dischargers who have an Annual NAL Exceedance or two (2) Instantaneous Maximum NAL Exceedances for a single parameter in a reporting year, will be assigned Level 1 Status in the following reporting year and be required to submit a Level 1 ERA Report prepared by a QISP. If the discharger continues to have exceedances in the next reporting year, Level 2 Status will be assigned in the following year and a Level 2 ERA Report prepared by a QISP will be required as well as Advanced BMPs to address pollutants in stormwater runoff.
  • Addition of the Qualified Industrial Stormwater Practitioner (QISP): If a facility enters Level 1 or Level 2 Status for any single parameter, QISP oversight is required. The facility must designate a QISP to oversee the performance of Permit related activities and train site personnel.
  • No Exposure Certification (NEC): Additional regulation of previously defined “light industry”, requiring tens of thousands of previously exempt businesses in California to file a No Exposure Certification by October of the reporting year, or file as a permit discharger.